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Corporate Culture
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Parallel Light/Proximity (Contact) Lithography
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Home
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DI Lithography/ Maskless Lithography
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1.3X-2.7X 405nm DI Lithography System
1.3X-2.7X 405nm DI Lithography System
1.3X-2.7X 405nm DI Lithography System
Trace Photolithography
Trace Photolithography
Specifications
Key Technical Indicators
Specifications
Magnification
1.3X-2.7X
waves
405nm
Line Width Resolution
15-50um
Application Fields
Applied to PCB Trace Layer Exposure Photolithography Process, with Excellent Depth of Focus
Product Consultation
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