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About Us
Company Profile
Corporate Culture
Development History
Patent Certificate
Qualification and Honor
Products
UV Components
DI Lithography/ Maskless Lithography
Parallel Light/Proximity (Contact) Lithography
Telematics Applications
Virtual Display/Myopia Prevention
Airborne Imaging Without Any Medium
Other Optics
Technology
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Join Us
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Brilliant BHOE
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Home
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DI Lithography/ Maskless Lithography
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1.3X-2.7X 405nm DI Lithography System
1.3X-2.7X 405nm DI Lithography System
1.3X-2.7X 405nm DI Lithography System
Trace Photolithography
Trace Photolithography
Specifications
Key Technical Indicators
Specifications
Magnification
1.3X-2.7X
waves
405nm
Line Width Resolution
15-50um
Application Fields
Applied to PCB Trace Layer Exposure Photolithography Process, with Excellent Depth of Focus
Product Consultation
Submit
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